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The zirconium silicon oxide film may be formed by atomic layer deposition. ... including an insulating layer having a zirconium ... forming zirconium and/or hafnium ...
... on the hafnium metal layer by atomic layer deposition form a hafnium oxide dielectric ... Atomic layer deposited ... Atomic layer deposited zirconium ...
A dielectric film containing a nanolaminate with a hafnium oxide layer and a zirconium oxide layer and a method of fabricating such a dielectric film produce a ...
In some embodiments aluminum fluoride thin films are deposited by ... comprises hafnium or zirconium. ... for atomic layer deposition of hafnium ...
An atomic layer deposited ZrAlxOy dielectric ... Zirconium and/or hafnium ... "Atomic layer Deposition of Zirconium Titanium Oxide from Titanium ...
Atomic layer deposited dielectric layers containing a lanthanum hafnium oxide layer and methods of fabricating such dielectric layers provide an insulating layer in a ...
The metal oxynitride layer is formed from zirconium oxynitride, hafnium ... A metal oxynitride layer formed by atomic layer deposition of a plurality of ...
The use of atomic layer deposition ... Forming the dielectric structure includes depositing zirconium oxide using atomic layer deposition using precursor ...
... a zirconium and/or hafnium-containing layer on ... nitrogen-doped polysilicon), a metallic layer 60, insulating ... Atomic layer deposition of zirconium-doped ...
A dielectric layer containing an atomic layer deposited insulating metal oxide film having multiple ... Genus, Inc. Vertically ... Atomic layer deposition of ...
The zirconium silicon oxide film may be formed by atomic layer deposition. The zirconium ... insulating layer having an atomic ... Atomic layer deposited hafnium ...
... comprising depositing a hafnium compound by atomic layer deposition to ... Zirconium and/or hafnium ... Method for forming gate insulating layer having ...
... layers provide an insulating layer in a variety of ... to deposit hafnium by atomic layer deposition. ... zirconium oxide atomic layer deposited ...
A capacitor structure is formed over a semiconductor substrate by atomic layer deposition ... insulating layer though an atomic ... hafnium oxide and zirconium ...
To form hafnium nitride by atomic layer deposition, a hafnium-containing precursor ... 1305-N include an insulating nitride layer. ... Zirconium and/or hafnium ...
... a zirconium and/or hafnium-containing layer on a ... a substrate in a vapor deposition process. The zirconium, hafnium, ... "Atomic layer deposition" ...
Forming a layer of hafnium oxide by atomic layer deposition and forming a ... in which a insulating layer is ... "Atomic Layer Deposition of Zirconium-Doped ...
To form hafnium nitride by atomic layer deposition, a hafnium-containing precursor ... 1305-N include an insulating nitride layer. ... Zirconium and/or hafnium ...
1. Introduction. Atomic layer deposition (ALD) has recently penetrated research and development lines of several major memory and logic manufacturers due to the ...
... such insulating layer may be advantageously used as a passivation layer in ... and an insulating layer deposited on the substrate by Atomic Layer Deposition ...
... wherein forming a layer of zirconium oxide includes forming a layer of zirconium oxide by atomic layer deposition. ... Genus, Inc: Radical ... a hafnium-based ...
Atomic layer deposited HfSiON dielectric films wherein each ... Atomic layer deposited zirconium ... oxide and hafnium oxide using atomic layer deposition:
... metal layer by atomic layer deposition form a hafnium oxide ... in insulating layer: ... Atomic layer deposited zirconium silicon oxide ...
Atomic layer deposited dielectric layers ... a lanthanum hafnium oxide layer is formed by depositing hafnium and lanthanum by atomic layer deposition onto a ...
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